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SPTS TECHNOLOGIES LIMITED patents filed
Company number: 07037852Title | Date Filed | Status | Publication number |
---|---|---|---|
Electrochemical deposition chamber | 2013-03-18 | Granted | GB2512056 |
Shielding design for backside metal deposition | 2005-10-28 | Granted | GB2419895 |
Methods and apparatus for sputtering | 2005-10-17 | Granted | GB2419138 |
Methods and apparatus for controlling rotating magnetic fields | 2005-04-13 | Granted | GB2413702 |
Methods and apparatus for processing wafers | 2005-02-23 | Granted | GB2423633 |
Electromagnet arrangement for generating a uniform planar magnetic field | 2004-12-08 | Granted | GB2409581 |
Substrate showerhead arrangement | 2004-09-24 | Granted | GB2418381 |
Depositing piezoelectric films for resonators | 2004-04-02 | Granted | GB2400490 |
RF stand offs | 2004-03-26 | Granted | GB2412485 |
Electrostatic clamping of thin wafers in plasma processing vacuum chambers | 2004-01-07 | Granted | GB2398166 |
Deposition methods and apparatus | 2003-06-23 | Granted | GB2390378 |
Shutter | 2003-05-01 | Granted | GB2390376 |
Plasma processing apparatus | 2003-04-22 | Granted | GB2387964 |
Forming tungsten or tungsten containing films using krypton or xenon as sputter gas; Tungsten/tungsten nitride stacks | 2003-03-11 | Granted | GB2399350 |
Plasma processing apparatus | 2003-02-04 | Granted | GB2411904 |
Plasma processing apparatus | 2003-02-04 | Granted | GB2401375 |
Depositing a tantalum film | 2002-07-15 | Granted | GB2393189 |
Method of depositing aluminium nitride | 2002-06-20 | Granted | GB2392676 |
Methods and apparatus for forming precursors | 2002-04-04 | Granted | GB2390379 |
A method of etching a substrate | 2002-03-27 | Granted | GB2374728 |
Methods of sputtering using Krypton | 2001-12-21 | Granted | GB2375117 |
Electrostatic clamping | 2001-12-04 | Granted | GB2375432 |
Magnetron sputtering apparatus | 2001-12-04 | Granted | GB2386128 |
Magnetron sputtering | 2001-07-18 | Granted | GB2377228 |
Method of cooling an induction coil | 2000-04-19 | Granted | GB2361587 |
Depositing dielectric | 2000-04-14 | Granted | GB2361244 |
Sputtering apparatus | 1999-12-24 | Granted | GB2346155 |
Forming barrier layers in semiconductor devices | 1999-11-04 | Granted | GB2357371 |
Deposition apparatus | 1999-05-11 | Granted | GB2350374 |
Depositing a layer | 1999-04-20 | Granted | GB2349392 |
Gas delivery system | 1999-03-08 | Granted | GB2347686 |
Inductive coil assembly | 1998-12-17 | Granted | GB2387023 |
Sputtering | 1998-10-23 | Granted | GB2342927 |
Apparatus for processing workpieces | 1998-06-25 | Granted | GB2341489 |
Electrostatic chucks | 1998-06-02 | Granted | GB2340659 |
Methods of forming a barrier layer based on titanium nitride | 1997-11-20 | Granted | GB2319533 |
Platen for semiconductor workpieces | 1997-09-18 | Granted | GB2329515 |
Temperature sensing methods and apparatus | 1996-04-23 | Granted | GB2300256 |
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